Nobel Lecture: Growth of GaN on sapphire via low-temperature deposited buffer layer and realization of p-type GaN by Mg doping followed by low-energy electron beam irradiation

被引:108
作者
Amano, Hiroshi [1 ]
机构
[1] Nagoya Univ, Dept Elect Engn & Comp Sci, Venture Business Lab,Akasaki Res Ctr, Chikusa Ku, Nagoya, Aichi 4648603, Japan
基金
日本科学技术振兴机构;
关键词
VAPOR-PHASE EPITAXY; LIGHT-EMITTING-DIODES; DOPED GAN; DOUBLE-HETEROSTRUCTURE; ROOM-TEMPERATURE; CRYSTAL-GROWTH; MOVPE GROWTH; FILMS; ALN; SUBSTRATE;
D O I
10.1103/RevModPhys.87.1133
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
This is a personal history of one of the Japanese researchers engaged in developing a method for growing GaN on a sapphire substrate, paving the way for the realization of smart television and display systems using blue LEDs. The most important work was done in the mid to late 1980s. The background to the author's work and the process by which the technology enabling the growth of GaN and the realization of p-type GaN was established are reviewed.
引用
收藏
页码:1133 / 1138
页数:6
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