Scanning X-ray interferometry over a millimeter baseline

被引:14
作者
Bergamin, A
Cavagnero, G
Cordiali, L
Mana, G
Zosi, G
机构
[1] POLITECN TORINO, DIPARTIMENTO ELETTRON, I-10129 TURIN, ITALY
[2] UNIV TURIN, DIPARTIMENTO FIS GEN A AVOGADRO, TURIN, ITALY
关键词
nanotechnology; optical interferometry; precision measurements; silicon lattice parameter; translation devices; X-ray interferometry; OPTICAL INTERFEROMETRY; ABSOLUTE MEASUREMENT; TRANSLATION DEVICE; SILICON CRYSTAL; RESOLUTION;
D O I
10.1109/19.571920
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new translation device has been developed at the Istituto di Metrologia ''G. Colonnetti'' (IMGC) to improve the measurement of the (220) lattice spacing in silicon by X-ray/optical interferometry, It is capable of millimeter linear displacement and servo controls ensure picometer and nanoradian resolutions in crystal position and attitude, It has been successfully used to drive a scanning X-ray interferometer over a 2 mm displacement, thus extending by more than one order of magnitude the maximum crystal movement obtained before.
引用
收藏
页码:576 / 579
页数:4
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