共 21 条
Comparison of degradation caused by dislocation motion in compound semiconductor light-emitting devices
被引:30
作者:

Sugiura, L
论文数: 0 引用数: 0
h-index: 0
机构: Mat. and Devices Res. Laboratories, Research and Development Center, Toshiba Corporation, Saiwai-ku
机构:
[1] Mat. and Devices Res. Laboratories, Research and Development Center, Toshiba Corporation, Saiwai-ku
关键词:
D O I:
10.1063/1.118523
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Dislocation glide velocities in GaAlAs/GaAs, InGaAsP/InP, and GaN-based light-emitting devices are estimated. These results are consistent with device degradation rates related to dislocation motion. It is clarified that the long lifetime of GaN-based devices with high dislocation density is principally due to extremely small dislocation mobility, partly due to small shear stress for dislocation motion, and due little to the radiation enhancement effect. (C) 1997 American Institute of Physics.
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页码:1317 / 1319
页数:3
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