Evidence of postdeposition nucleation in organic molecular thin films

被引：11

作者：

Berlanda, G

Campione, M

Moret, M

Sassella, A

Borghesi, A

机构：

[1] Univ Milano Bicocca, Dipartimento Sci Mat, I-20125 Milan, Italy

[2] Univ Milano Bicocca, Ist Nazl Fis Mat, I-20125 Milan, Italy

来源：

PHYSICAL REVIEW B | 2004年 / 69卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.69.085409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We analyze the growth of 1-nm-thick films of an organic molecule grown on silica by means of molecular beam deposition. Samples were deposited at a constant rate over a very wide substrate temperature range. By an ex situ atomic force microscopy study two main behaviors are revealed: for samples deposited below 200 K the density of islands is temperature independent and is demonstrated to arise from postnucleation phenomena; above 200 K island density scales with temperature following an Arrhenius law, allowing us to estimate an energy barrier for monomer diffusion of (0.122+/-0.011) eV.

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页数：4

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