The influence of bond flexibility and molecular size on the chemically selective bonding of In2O and Ga2O on GaAs(001)-c(2x8)/(2x4)

被引:16
作者
Hale, MJ [1 ]
Sexton, JZ
Winn, DL
Kummel, AC
Erbudak, M
Passlack, M
机构
[1] Univ Calif San Diego, Dept Chem, La Jolla, CA 92093 USA
[2] ETH, Dept Phys, CH-8093 Zurich, Switzerland
[3] Motorola Inc, Semicond Prod Sector, Tempe, AZ 85284 USA
关键词
D O I
10.1063/1.1648016
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The surface structures formed upon deposition of In2O and Ga2O by molecular beam epitaxy onto the arsenic-rich GaAs(001)-c(2x8)/(2x4) surface have been studied using scanning tunneling microscopy and density functional theory. In2O initially bonds, with indium atoms bonding to second layer gallium atoms within the trough, and proceeds to insert into or between first layer arsenic dimer pairs. In contrast, Ga2O only inserts into or between arsenic dimer pairs due to chemical site constraints. The calculated energy needed to bend a Ga2O molecule approximately 70degrees, so that it can fit into an arsenic dimer pair, is 0.6 eV less than that required for In2O. The greater flexibility of the Ga2O molecule causes its insertion site to be 0.77 eV more exothermic than the In2O insertion site. This result shows that although trends in the periodic table can be used to predict some surface reactions, small changes in atomic size can play a significant role in the chemistry of gas/surface reactions through the indirect effects of bond angle flexibility and bond length stiffness. (C) 2004 American Institute of Physics.
引用
收藏
页码:5745 / 5754
页数:10
相关论文
共 60 条
[1]   40 years MOS technology - from empiricism to science [J].
Balk, P .
MICROELECTRONIC ENGINEERING, 1999, 48 (1-4) :3-6
[2]   DOMAIN FORMATION ON THE RECONSTRUCTED GAAS(001) SURFACE [J].
BEHREND, J ;
WASSERMEIER, M ;
DAWERITZ, L ;
PLOOG, KH .
SURFACE SCIENCE, 1995, 342 (1-3) :63-68
[3]   Sn-enhanced epitaxial thickness during low-temperature Ge(001) molecular-beam epitaxy [J].
Bratland, KA ;
Foo, YL ;
Desjardins, P ;
Greene, JE .
APPLIED PHYSICS LETTERS, 2003, 82 (24) :4247-4249
[4]   Passivation of defects at the SrTiO3/Si interface with H and H2 [J].
Browne, RJ ;
Ogryzlo, EA ;
Eisenbeiser, K ;
Yu, Z ;
Droopad, R ;
Overgaard, C .
APPLIED PHYSICS LETTERS, 2002, 80 (15) :2699-2700
[5]   SYSTEMATICS OF EVAPORATION COEFFICIENT AL2O3 GA2O3 IN2O3 [J].
BURNS, RP .
JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (09) :3307-+
[6]   Study of surface roughening of tensily strained Si1-x-yGexCy films grown by ultra high vacuum-chemical vapor deposition [J].
Calmes, C ;
Bouchier, D ;
Debarre, D ;
Le Thanh, V ;
Clerc, C .
THIN SOLID FILMS, 2003, 428 (1-2) :150-155
[7]   NONSTOICHIOMETRY AND CRYSTAL-GROWTH OF GADOLINIUM GALLIUM GARNET [J].
CARRUTHERS, JR ;
KOKTA, M ;
BARNS, RL ;
GRASSO, M .
JOURNAL OF CRYSTAL GROWTH, 1973, 19 (03) :204-208
[8]   Annealing of thin Zr films on Si1-xGex(0 ≤ x ≤ 1):: X-ray diffraction and Raman studies [J].
Chaix-Pluchery, O ;
Chenevier, B ;
Aubry-Fortuna, V ;
Matko, I .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2002, 63 (10) :1889-1900
[9]   Effect of surface intermixing on the morphology of Sb-terminated Ge(100) surfaces [J].
Chan, LH ;
Altman, EI .
PHYSICAL REVIEW B, 2001, 63 (19)
[10]   Evolution of the GaAs(001) surface structure during the transition from the As-rich (2x4) to the Ga-rich (4x2) reconstruction [J].
Chizhov, I ;
Lee, G ;
Willis, RF ;
Lubyshev, D ;
Miller, DL .
SURFACE SCIENCE, 1998, 419 (01) :1-11