Investigation of the effects of pumping speed and Ar/O-2 ratio on the transient time at mode transition in Ti-O-2 reactive sputtering

被引：15

作者：

Kusano, E

Kinbara, A

机构：

[1] Dept. of Mat. Sci. and Engineering, Kanazawa Institute of Technology, Ishikawa Pref., 921, Nonoichi-machi

来源：

THIN SOLID FILMS | 1996年 / 281卷 / 1-2期

关键词：

glow discharge; sputtering; deposition process;

D O I：

10.1016/0040-6090(96)08665-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of the pumping speed and the Ar/O-2 flow rate ratio on the transient time needed to reach a steady-state, after glow discharge ignition in Ti-O-2 reactive sputtering, were investigated. It was shown that the O-2 partial pressure, deposition rate, discharge voltage and the Ti emission intensity change continuously after glow discharge ignition until the process reaches a steady-state. The transient time increases as the pumping speed increases or as the Ar/O-2 ratio increases. The results suggest that a low pumping speed or a low Ar/O-2 ratio shortens the transient time for process operation parameter changes such as a reactive gas flow rate change.

引用

页码：423 / 426

页数：4

共 9 条

[1] EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS [J].