Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress

被引:167
作者
Chen, Te-Chih [1 ,2 ]
Chang, Ting-Chang [1 ,2 ]
Tsai, Chih-Tsung [1 ,2 ]
Hsieh, Tien-Yu [1 ,2 ]
Chen, Shih-Ching [1 ,2 ]
Lin, Chia-Sheng [3 ]
Hung, Ming-Chin [4 ]
Tu, Chun-Hao [4 ]
Chang, Jiun-Jye [4 ]
Chen, Po-Lun [4 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[2] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Kaohsiung 804, Taiwan
[3] Natl Sun Yat Sen Univ, Dept Elect Engn, Kaohsiung 804, Taiwan
[4] AU Optron, Adv Display Technol Res Ctr, Hsinchu 30078, Taiwan
关键词
amorphous semiconductors; dark conductivity; electron traps; indium compounds; semiconductor thin films; thin film transistors; ROOM-TEMPERATURE;
D O I
10.1063/1.3481676
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this letter, we investigate the impact of the light illumination on the stability of indium-gallium-zinc oxide thin film transistors under positive gate-bias stress. The noticeable decrease in threshold voltage (V(t)) shift more than 5.5 V under illuminated positive gate-bias stress indicates a superior reliability in contrast with the dark stress. The accelerated V(t) recovery characteristic compared with dark recovery demonstrates that the charge detrapping effect was enhanced under illumination. Furthermore, the average effective energy barrier of charge trapping and detrapping was derived to verify that illumination can excite the trapped charges and accelerate the charge detrapping process. (c) 2010 American Institute of Physics. [doi:10.1063/1.3481676]
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页数:3
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