共 18 条
[2]
FISCHL DS, 1986, J VAC SCI TECHNOL A, V4, P1841
[3]
Flash technology: Challenges and opportunities
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1996, 35 (12B)
:6347-6350
[4]
PATTERN FABRICATION BY OBLIQUE-INCIDENCE ION-BEAM ETCHING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 18 (01)
:23-27
[5]
Hess D.W., 1982, PLASMA CHEM PLASMA P, V2, P141
[6]
HONG JS, IN PRESS
[8]
High rate dry etching of Ni0.8Fe0.2 and NiFeCo
[J].
APPLIED PHYSICS LETTERS,
1997, 71 (09)
:1255-1257
[9]
JUNG KB, 1998, J VAC SCI TECHN 0516