Kelvin probe force microscopy without bias-voltage feedback

被引：29

作者：

Takeuchi, Osamu ^{[1
]}

Ohrai, Yoshihisa ^{[1
]}

Yoshida, Shoji ^{[1
]}

Shigekawa, Hidemi ^{[1
]}

机构：

[1] Univ Tsukuba, 21st Century COE, CREST JST, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2007年 / 46卷 / 8B期

关键词：

Kelvin probe force microscopy; atomic force microscopy;

D O I：

10.1143/JJAP.46.5626

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A variation of Kelvin probe force microscopy that does not require bias-voltage feedback for contact potential difference (CPD) detection was proposed. Two independent lock-in amplifiers were used to measure the first- and second-order derivatives of the electrostatic force exerted on the cantilever, and CPD was deductively determined from these signals. The application of this technique to the unsaturated Au/Si(111)-5 x 2 system confirmed that the instability of the measurement system resulting from bias-voltage feedback can be completely eliminated and that CPD measurement at a finite bias voltage is possible.

引用

页码：5626 / 5630

页数：5

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