Vertical enhancement-mode InAs nanowire field-effect transistor with 50-nm wrap gate

We present results on fabrication and de characterization of vertical InAs nanowire wrap-gate field-effect transistor arrays with a gate length of 50 nm. The wrap gate is defined by evaporation of 50-nm Cr onto a 10-nm-thick HfO2 gate dielectric, where the gate is also separated from the source contact with a 100-nm SiOx spacer layer. For a drain voltage of 0.5 V, we observe a normalized transconductance of 0.5 S/mm, a subthreshold slope around 90 mV/dec, and a threshold voltage just above 0 V. The highest observed normalized on current is 0.2 A/mm, with an off current of 0.2 mA/mm. These devices show a considerable improvement compared to previously reported vertical InAs devices with SiNx gate dielectrics.