Kelvin probe force microscopy on InAs thin films grown on GaAs giant step structures formed on (110) GaAs vicinal substrates

被引:29
作者
Ono, S
Takeuchi, M
Takahashi, T
机构
[1] Univ Tokyo, Inst Ind Sci, Minato Ku, Tokyo 1068558, Japan
[2] Inst Phys & Chem Res, Semicond Lab, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1348318
中图分类号
O59 [应用物理学];
学科分类号
摘要
Surface potential measurements on InAs thin films grown on GaAs giant steps were performed by Kelvin probe force microscopy. We found that the removal of the water-related layer from both surfaces on a sample and a tip was very effective to improve the reliability of the surface potential measurements. The measured potential distribution corresponds to the surface corrugation of the InAs thin films. In addition, the InAs layer thickness dependence of the surface InAs Fermi levels is investigated, indicating that the surface Fermi level shifts toward the vacuum level as the increase of the InAs layer thickness. (C) 2001 American Institute of Physics.
引用
收藏
页码:1086 / 1088
页数:3
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