Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD

被引:96
作者
Groenen, R
Löffler, J
Sommeling, PM
Linden, JL
Hamers, EAG
Schropp, REI
van de Sanden, MCM
机构
[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands
[2] Univ Utrecht, Debye Inst, Inst Devices, NL-3508 TA Utrecht, Netherlands
[3] ECN, NL-1755 ZG Petten, Netherlands
[4] TNO, TPD, Div Mat Res & Technol, NL-5600 AN Eindhoven, Netherlands
关键词
zinc oxide; plasma deposition; surface texture; solar cells;
D O I
10.1016/S0040-6090(01)01032-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An expanding thermal plasma created by a cascaded are is used to deposit surface textured ZnO films. Films have been deposited at 150-350 degreesC at a rate of typically 0.70 nm/s. They exhibit low resistivity (< 10(-3) Omega cm), high transmittance in the visible wavelength region(> 80%) and a rough surface texture. The crystallite size and surface roughness increase with increasing deposition temperature and flow of argon ions. At the same time columnar textured growth gets less pronounced, a change to granular growth is observed. First p-i-n a-Si:H solar cells deposited on this material with initial efficiencies approaching 10% have been realised. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:226 / 230
页数:5
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