TiCN coatings on aluminum alloy formed by MO-PACVD

被引:29
作者
Kim, SK [1 ]
Kim, TH
Wöhle, J
Rie, KT
机构
[1] Univ Ulsan, Sch Mat & Met Engn, Ulsan 680749, South Korea
[2] Fraunhofer Inst Schicht & Oberflachentech, D-38108 Braunschweig, Germany
[3] Tech Univ Braunschweig, Inst Oberflachentech & Plasmatech Werkstoffentwic, D-38108 Braunschweig, Germany
关键词
TiCN coating; aluminum alloy; metal-organic compound; wear resistance;
D O I
10.1016/S0257-8972(00)00831-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
TiCN layers were deposited on an aluminum alloy (Si 0.5%, Fe 0.5%, Cu 4.3%, Mn 0.6%, Mg 1.5%, Cr 0.1%, Zn 0.25%, bal. Al) by using diethylaminotitanium, hydrogen and nitrogen with the pulsed d.c. PACVD process. The effect of process parameters such as precursor evaporation temperature, duty ratio, frequency, voltage, H-2/N-2 gas ratio on the properties of the TiCN layer was investigated. The layer thus obtained had high hardness and a low friction coefficient. Detailed results on the hardness, surface morphology, WDS analysis, wear test and scratch test of these layers are presented. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:121 / 126
页数:6
相关论文
共 8 条
[1]  
HAN JG, 1998, PSE 98 GARMP SEPT 14
[2]   Properties of composite Ti(NCO) layers formed on tool steel under glow discharge conditions [J].
Kim, SK ;
Wierzchon, T ;
Sobiecki, JR .
SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3) :268-271
[3]  
NIKUCHI N, 1984, P 9 INT C CVD PENN N, P728
[4]   SYNTHESIS OF THIN COATINGS BY PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION USING METALLOORGANIC COMPOUNDS AS PRECURSORS [J].
RIE, KT ;
WOHLE, J ;
GEBAUER, A .
SURFACE & COATINGS TECHNOLOGY, 1993, 59 (1-3) :202-206
[5]   PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF HARD COATINGS WITH METALLOORGANIC COMPOUNDS [J].
RIE, KT ;
GEBAUER, A .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 (1-2) :61-66
[6]   Low temperature coating of aluminium alloys by plasma-CVD using metallo-organic compounds [J].
Rie, KT ;
Wohle, J ;
Gebauer, A .
SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3) :1534-1540
[7]   APPLICATIONS AND TRENDS IN PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION [J].
SUHR, H .
SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3) :233-238
[8]   THIN ZIRCONIUM NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CVD [J].
WENDEL, H ;
SUHR, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 54 (04) :389-392