Growth of ZnSxSe1-x layers on Si substrates by atomic layer epitaxy

被引:32
作者
Hsu, CT [1 ]
机构
[1] Natl Huwei Inst Technol, Dept Elect Engn, Huwei, Yun Lin, Taiwan
关键词
atomic layer epitaxy (ALE); ZnSxSe1-x;
D O I
10.1016/S0254-0584(98)00238-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomic layer epitaxy (ALE) by metalorganic vapor epitaxy has been used to grow ZnSxSe1-x epitaxial layers on Si substrates. The dimethylzinc (DMZn), hydrogen sulfide (H2S) and hydrogen selenium (H2Se) used as zinc? sulfur and selenium sources, respectively The dependence of the composition of the ZnSxSe1-x films on H2S, H2Se flow rate and [H2S]/[H2S]+[H2Se] ratio were investigated. The conditions for growing ZnSxSe1-x layer with x = 0.93 (lattice matched on Si) were determined. The characterizations of epilayers were examined by using scanning electron microscope energy dispersive spectrometer, X-ray diffraction and photoluminescence. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:6 / 11
页数:6
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