Estimation and verification of the electrical properties of indium tin oxide based on the energy band diagram

被引:39
作者
Kulkami, AK
Knickerbocker, SA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 03期
关键词
D O I
10.1116/1.580324
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Indium tin oxide (ITO) is a transparent conducting oxide used in a variety of optoelectronic applications. In order to optimize the electrical conductivity of ITO thin films it is necessary to determine this property as a function of optimum electron concentration (e.g., doping of In2O3 with Sn). A new software program called CRYSTAL 92 is used to determine the energy band diagrams of In2O3 and In2O3 doped with Sn. Using the curvature of the conduction bands, the effective mass of the electrons is estimated and an empirical relationship is established between the effective mass and free carrier concentration using experimentally observed optical effective mass values. The importance of the varying electron effective mass in the prediction of the electron mobility? and hence the electrical conductivity, is shown here by comparing the published experimental results with the estimated results. The limiting factor in thr electron mobility appears to be either grain boundary scattering or ion impurity scattering. The mobility due to neutral impurity scattering appears to have a negligible effect on the overall mobility unless the neutral impurity concentration reaches extremely high values. (C) 1996 American Vacuum Society.
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页码:1709 / 1713
页数:5
相关论文
共 19 条
[11]   ELECTRICAL AND OPTICAL-PROPERTIES OF VACUUM-EVAPORATED INDIUM - TIN OXIDE-FILMS WITH HIGH ELECTRON-MOBILITY [J].
NAGATOMO, T ;
MARUTA, Y ;
OMOTO, O .
THIN SOLID FILMS, 1990, 192 (01) :17-25
[12]   OPTICAL-PROPERTIES OF RF REACTIVE SPUTTERED TIN-DOPED IN2O3 FILMS [J].
OHHATA, Y ;
SHINOKI, F ;
YOSHIDA, S .
THIN SOLID FILMS, 1979, 59 (02) :255-261
[13]  
PISANI C, 1985, LECTURE NOTES CHEM, V48
[14]   GROWTH OF PURE AND TIN-DOPED INDIUM OXIDE CRYSTALS AND THEIR ELECTRICAL-PROPERTIES [J].
SHIMADA, S ;
SATO, I ;
KODAIRA, K ;
MATSUSHITA, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (12) :3165-3167
[15]  
SHOCKLEY W, 1950, HOLES ELECT SEMICOND, P276
[16]   PREPARATION AND CHARACTERIZATION OF RF SPUTTERED INDIUM TIN OXIDE-FILMS [J].
SREENIVAS, K ;
RAO, TS ;
MANSINGH, A ;
CHANDRA, S .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) :384-392
[17]   THE GROWTH AND STRUCTURE OF RF SPUTTERED INDIUM TIN OXIDE THIN-FILMS [J].
SREENIVAS, K ;
MANSINGH, A .
APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY) :670-680
[18]  
SZE SM, 1981, PHYSICS SEMICONDUCTO, P27
[19]   INDIUM TIN OXIDE-FILMS BY SEQUENTIAL EVAPORATION [J].
YAO, JL ;
HAO, S ;
WILKINSON, JS .
THIN SOLID FILMS, 1990, 189 (02) :227-233