THE GROWTH AND STRUCTURE OF RF SPUTTERED INDIUM TIN OXIDE THIN-FILMS

被引:4
作者
SREENIVAS, K
MANSINGH, A
机构
来源
APPLICATIONS OF SURFACE SCIENCE | 1985年 / 22-3卷 / MAY期
关键词
D O I
10.1016/0378-5963(85)90200-4
中图分类号
学科分类号
摘要
引用
收藏
页码:670 / 680
页数:11
相关论文
共 13 条
[1]   THE INFLUENCE OF TARGET OXIDATION AND GROWTH-RELATED EFFECTS ON THE ELECTRICAL-PROPERTIES OF REACTIVELY SPUTTERED FILMS OF TIN-DOPED INDIUM OXIDE [J].
BUCHANAN, M ;
WEBB, JB ;
WILLIAMS, DF .
THIN SOLID FILMS, 1981, 80 (04) :373-382
[2]   TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].
CHOPRA, KL ;
MAJOR, S ;
PANDYA, DK .
THIN SOLID FILMS, 1983, 102 (01) :1-46
[3]   EFFECT OF O2 PRESSURE DURING DEPOSITION ON PROPERTIES OF RF-SPUTTERED SN-DOPED IN2O3 FILMS [J].
FAN, JCC ;
BACHNER, FJ ;
FOLEY, GH .
APPLIED PHYSICS LETTERS, 1977, 31 (11) :773-775
[4]   X-RAY PHOTOEMISSION SPECTROSCOPY STUDIES OF SN-DOPED INDIUM-OXIDE FILMS [J].
FAN, JCC ;
GOODENOUGH, JB .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3524-3531
[5]  
FUZINAKA M, 1983, THIN SOLID FILMS, V10, P7
[6]   EFFECTS OF HEAT-TREATMENT ON OPTICAL AND ELECTRICAL-PROPERTIES OF INDIUM-TIN OXIDE-FILMS [J].
HAINES, WG ;
BUBE, RH .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (01) :304-307
[7]   STUDY OF FILMS HAVING BASE OF TIN OXIDE AND INDIUM OXIDE BY MEANS OF X-RAY-DIFFRACTION [J].
HECQ, M ;
DUBOIS, A ;
VANCAKEN.J .
THIN SOLID FILMS, 1973, 18 (01) :117-125
[8]   PREPARATION AND PROPERTIES OF REACTIVELY CO-SPUTTERED TRANSPARENT CONDUCTING FILMS [J].
LEHMANN, HW ;
WIDMER, R .
THIN SOLID FILMS, 1975, 27 (02) :359-368
[9]   THE DYNAMICS OF REACTIVE ION SPUTTERING OF SN-SB AND IN-SN ALLOYS IN AN AR-O2 ATMOSPHERE [J].
LEJA, E ;
KOLODZIEJ, A ;
PISARKIEWICZ, T ;
STAPINSKI, T .
THIN SOLID FILMS, 1981, 76 (03) :283-287
[10]  
MAISSEL LI, 1970, HDB THIN FILM TECHNO, P9