Ga-assisted catalyst-free growth mechanism of GaAs nanowires by molecular beam epitaxy

被引:375
作者
Colombo, C. [1 ]
Spirkoska, D. [1 ]
Frimmer, M. [1 ]
Abstreiter, G. [1 ]
Morral, A. Fontcuberta I. [1 ]
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
来源
PHYSICAL REVIEW B | 2008年 / 77卷 / 15期
关键词
D O I
10.1103/PhysRevB.77.155326
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanisms of Ga-assisted GaAs nanowires grown by molecular beam epitaxy are addressed. The axial and radial growth rates as a function of the Ga rate and As pressure indicate that on the opposite of what is observed in thin film epitaxy, the growth rate of the nanowires is arsenic limited. As a consequence, the axial growth rate of the wires can be controlled by the As-4 pressure. Additionally, due to the small As-4 pressure leading to nanowire growth, the deposition on the facets is very slow, leading to a much lower radial growth rate. Finally, we present a model that is able to accurately describe the presented observations and predicts a maximum length of nontapered nanowires of 40 mu m.
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页数:5
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