Silicon quantum integrated circuits -: an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques

被引:14
作者
Paul, DJ
Coonan, B
Redmond, G
O'Neill, BJ
Crean, GM
Holländer, B
Mantl, S
Zozoulenko, I
Berggren, KF
Lazzari, JL
d'Avitaya, FA
Derrien, J
机构
[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0BN, England
[2] Natl Microelect Res Ctr, Cork, Ireland
[3] KFA Julich GmbH, Forschungszentrum, ISI IT, Inst Schicht & Ionentech, D-52425 Julich, Germany
[4] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[5] CNRS, CRMC2, F-13288 Marseille 9, France
关键词
complementary metal oxide semiconductor; SiGe; quantum devices; heterostructure field effect transistors;
D O I
10.1016/S0040-6090(98)01219-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An introduction to the methodology, design concepts, fabrication routes and potential applications is presented of research to fabricate quantum devices on a complementary metal oxide semiconductor (CMOS) fabrication line. Si/Si1-xGex heterostructure field effect transistors, velocity modulation transistors and resonant tunnelling diodes are considered and initial fabrication stages discussed. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:130 / 136
页数:7
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