complementary metal oxide semiconductor;
SiGe;
quantum devices;
heterostructure field effect transistors;
D O I:
10.1016/S0040-6090(98)01219-X
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
An introduction to the methodology, design concepts, fabrication routes and potential applications is presented of research to fabricate quantum devices on a complementary metal oxide semiconductor (CMOS) fabrication line. Si/Si1-xGex heterostructure field effect transistors, velocity modulation transistors and resonant tunnelling diodes are considered and initial fabrication stages discussed. (C) 1998 Elsevier Science S.A. All rights reserved.