Iron-acceptor pairs in silicon: Structure and formation processes

被引:28
作者
Zhao, S [1 ]
Assali, LVC [1 ]
Justo, JF [1 ]
Gilmer, GH [1 ]
Kimerling, LC [1 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
D O I
10.1063/1.1389763
中图分类号
O59 [应用物理学];
学科分类号
摘要
We performed a theoretical investigation on the properties of iron-acceptor impurity pairs (Fe-A, with A=B, Al, Ga, and In) in silicon. The calculations were performed within the framework of an ionic model, including elastic and electrostatic interactions. In contrast to the conventional point charge ionic model, our model includes a correction to the electrostatic interaction that takes into account the valence electronic cloud polarization, which adds a short range, attractive interaction to Fe-A pair bonding, and includes the silicon lattice relaxation due to the atomic size difference between the acceptor and the lattice atoms. Our results are in good agreement with the experimental trends among the Fe-A pairs, describing the increase in the pair donor energy level with increasing A principal quantum number and decreasing pair separation distance, and the pair configurational symmetries. (C) 2001 American Institute of Physics.
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收藏
页码:2744 / 2754
页数:11
相关论文
共 52 条
[1]  
[Anonymous], 1981, PHYS SEMICONDUCTORS
[2]   INTERSTITIAL DEFECT REACTIONS IN SILICON [J].
ASOM, MT ;
BENTON, JL ;
SAUER, R ;
KIMERLING, LC .
APPLIED PHYSICS LETTERS, 1987, 51 (04) :256-258
[3]  
Assali L. V. C., 1989, Materials Science Forum, V38-41, P409, DOI 10.4028/www.scientific.net/MSF.38-41.409
[4]  
Assali L. V. C., 1986, Materials Science Forum, V10-12, P55, DOI 10.4028/www.scientific.net/MSF.10-12.55
[5]   ELECTRONIC-PROPERTIES OF THE IRON-BORON IMPURITY PAIR IN SILICON [J].
ASSALI, LVC ;
LEITE, JR .
PHYSICAL REVIEW B, 1987, 36 (02) :1296-1299
[6]   Electronic properties and hyperfine parameters of gold-3d-transition-metal impurity pairs in silicon [J].
Assali, LVC ;
Justo, JF .
PHYSICAL REVIEW B, 1998, 58 (07) :3870-3878
[7]  
Bourgoin J., 1983, POINT DEFECTS SEMICO, V1
[8]   IRON AND THE IRON-BORON COMPLEX IN SILICON [J].
BROTHERTON, SD ;
BRADLEY, P ;
GILL, A .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) :1941-1943
[9]   METASTABLE-DEFECT BEHAVIOR IN SILICON - CHARGE-STATE-CONTROLLED REORIENTATION OF IRON-ALUMINUM PAIRS [J].
CHANTRE, A ;
BOIS, D .
PHYSICAL REVIEW B, 1985, 31 (12) :7979-7988
[10]  
Chantre A., 1986, Materials Science Forum, V10-12, P387, DOI 10.4028/www.scientific.net/MSF.10-12.387