Ultra-fine machining tool/molds by LIGA technology

被引:76
作者
Yang, H [1 ]
Pan, CT
Chou, MC
机构
[1] Ind Technol Res Inst, MIRL, Hsinchu 310, Taiwan
[2] Natl Chung Hsing Univ, Inst Precis Engn, Taichung 402, Taiwan
[3] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
关键词
D O I
10.1088/0960-1317/11/2/302
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Machining tools based on the excimer laser and x-ray lithography to make ultra-fine machining tool/molds are described in this paper. The lower high-aspect ratio resist molds are fabricated using the KrF excimer laser. The higher aspect-ratio resist molds are made using x-ray lithography. Both low and high aspect-ratio resist molds are then converted into metallic structures using electroforming, The NiCo/SiC microcomposite electroforming with low internal stress (similar to0 kg mm(-2)) and high hardness (>Hv500) shows its feasibility as mold materials. An example of 2 mm thick integrated circuit. (IC) packaging leadframe patterns using x-ray micromachining is illustrated to prove its feasible application. On the technical side, micro-structures with a high aspect ratio of 30 were developed using a graphite membrane based x-ray mask.
引用
收藏
页码:94 / 99
页数:6
相关论文
共 19 条
[1]  
Ball Z, 1996, APPL PHYS A-MATER, V62, P203, DOI 10.1007/BF01575082
[2]  
Becker E. W., 1986, Microelectronic Engineering, V4, P35, DOI 10.1016/0167-9317(86)90004-3
[3]   FABRICATION OF CAPACITIVE ACCELERATION SENSORS BY THE LIGA TECHNIQUE [J].
BURBAUM, C ;
MOHR, J ;
BLEY, P ;
EHRFELD, W .
SENSORS AND ACTUATORS A-PHYSICAL, 1991, 27 (1-3) :559-563
[4]  
CHANGGENG X, 1988, PLATING SURFACE OCT, P54
[5]   Ultra-deep LIGA process [J].
Cheng, Y ;
Shew, BY ;
Lin, CY ;
Wei, DH ;
Chyu, MK .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1999, 9 (01) :58-63
[6]   Micromachining program status at the SRRC [J].
Cheng, Y ;
Shew, BY ;
Shih, WP ;
Wang, SS ;
Lin, CY ;
Yang, WK ;
Lu, M ;
Lee, WH .
MICROSYSTEM TECHNOLOGIES, 1997, 4 (01) :12-16
[7]  
CHENG Y, 1996, SRRCDXLIM9604 IND AP
[8]   EFFECT OF ELECTRODEPOSITION PARAMETERS ON THE MICROSTRUCTURE AND MECHANICAL-PROPERTIES OF CO-NI ALLOYS [J].
FENINECHE, N ;
CODDET, C ;
SAIDA, A .
SURFACE & COATINGS TECHNOLOGY, 1990, 41 (01) :75-81
[9]  
GUCKEL H, 1991, P IEEE MICR EL MECH, P74
[10]   EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J].
KAWAMURA, Y ;
TOYODA, K ;
NAMBA, S .
APPLIED PHYSICS LETTERS, 1982, 40 (05) :374-375