Surface energies and surface relaxation at TiSi2 competing phases

被引:13
作者
Iannuzzi, M
Miglio, L
机构
[1] Univ Milan, Dipartimento Sci Mat, I-20125 Milan, Italy
[2] Univ Milan, Ist Nazl Fis Mat, I-20125 Milan, Italy
关键词
molecular dynamics; semi-empirical models and model calculations; surface energy; surface relaxation and reconstruction; silicides; low index single crystal surfaces; surface structure; morphology; roughness and topography;
D O I
10.1016/S0039-6028(01)00979-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, we provide an estimate of the energy and the relaxed structure for some low index surfaces of TiSi2 phases, as obtained by molecular dynamics simulations with an original tight binding potential. Comparison of the average surface tensions for C54 and C49 competing crystal structures is also obtained by the data of spherical clusters with increasing radius. We show that the C49 form displays a lower surface energy, and that in both cases surface relaxations and reconstructions are produced by an inward motion of the surface Ti atoms. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:201 / 212
页数:12
相关论文
共 29 条
[21]   INITIAL REACTIONS AND SILICIDE FORMATION OF TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY [J].
NEMANICH, RJ ;
FULKS, RT ;
STAFFORD, BL ;
VANDERPLAS, HA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :938-941
[22]  
NEMANICH RJ, 1986, MATER RES SOC S P, V54, P255
[23]  
ROSENKRANZ R, 1992, Z METALLKD, V83, P9
[24]   IN-SITU X-RAY-DIFFRACTION ANALYSIS OF THE C49-C54 TITANIUM SILICIDE PHASE-TRANSFORMATION IN NARROW LINES [J].
ROY, RA ;
CLEVENGER, LA ;
CABRAL, C ;
SAENGER, KL ;
BRAUER, S ;
JORDANSWEET, J ;
BUCCHIGNANO, J ;
STEPHENSON, GB ;
MORALES, G ;
LUDWIG, KF .
APPLIED PHYSICS LETTERS, 1995, 66 (14) :1732-1734
[25]   SCANNING FUNNELING MICROSCOPE CRYSTALLOGRAPHY OF TITANIUM SILICIDE ON SI(100) SUBSTRATES [J].
STEPHENSON, AW ;
WELLAND, ME .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (02) :563-571
[26]   SCANNING TUNNELING MICROSCOPE INVESTIGATION OF THE GROWTH-MORPHOLOGY OF TITANIUM SILICIDE ON SI(111) SUBSTRATES [J].
STEPHENSON, AW ;
WELLAND, ME .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (08) :5143-5154
[27]   HIGH-TEMPERATURE PROCESS LIMITATION ON TISI2 [J].
TING, CY ;
DHEURLE, FM ;
IYER, SS ;
FRYER, PM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (12) :2621-2625
[28]  
Villars P., 1997, Pearson's Handbook of Crystallographic Data for Intermetallic Phases
[29]   Correlation of morphology and electrical properties of nanoscale TiSi2 epitaxial islands on Si (001) [J].
Yang, W ;
Jedema, FJ ;
Ade, H ;
Nemanich, RJ .
THIN SOLID FILMS, 1997, 308 :627-633