INITIAL REACTIONS AND SILICIDE FORMATION OF TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY

被引:52
作者
NEMANICH, RJ
FULKS, RT
STAFFORD, BL
VANDERPLAS, HA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词
D O I
10.1116/1.573355
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:938 / 941
页数:4
相关论文
共 9 条
  • [1] TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM
    BERTI, M
    DRIGO, AV
    COHEN, C
    SIEJKA, J
    BENTINI, GG
    NIPOTI, R
    GUERRI, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3558 - 3565
  • [2] SOLID-STATE REACTIONS IN TITANIUM THIN-FILMS ON SILICON
    KATO, H
    NAKAMURA, Y
    [J]. THIN SOLID FILMS, 1976, 34 (01) : 135 - 138
  • [3] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON
    MURARKA, SP
    FRASER, DB
    [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 342 - 349
  • [4] Nemanich R.J., 1983, MRS ONLINE P LIBR, V25, P9, DOI [10.1557/PROC-25-9, DOI 10.1557/PROC-25-9]
  • [5] INTERFERENCE-ENHANCED RAMAN-SCATTERING OF VERY THIN TITANIUM AND TITANIUM-OXIDE FILMS
    NEMANICH, RJ
    TSAI, CC
    CONNELL, GAN
    [J]. PHYSICAL REVIEW LETTERS, 1980, 44 (04) : 273 - 276
  • [6] REACTIONS OF THIN-FILM TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY
    NEMANICH, RJ
    FULKS, RT
    STAFFORD, BL
    VANDERPLAS, HA
    [J]. APPLIED PHYSICS LETTERS, 1985, 46 (07) : 670 - 672
  • [7] INTERFERENCE ENHANCED RAMAN-SCATTERING STUDY OF THE INTERFACIAL REACTION OF PD ON A-SI-H
    NEMANICH, RJ
    TSAI, CC
    THOMPSON, MJ
    SIGMON, TW
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 685 - 688
  • [8] METAL-INDUCED CRYSTALLIZATION OF HYDROGENATED AMORPHOUS SI FILMS
    TSAI, CC
    NEMANICH, RJ
    THOMPSON, MJ
    STAFFORD, BL
    [J]. PHYSICA B & C, 1983, 117 (MAR): : 953 - 956
  • [9] 1983, MAT RES SOC S P, V25