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INITIAL REACTIONS AND SILICIDE FORMATION OF TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY

被引：52
作者：
NEMANICH, RJ
FULKS, RT
STAFFORD, BL
VANDERPLAS, HA
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期
关键词：
D O I：
10.1116/1.573355
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：938 / 941
页数：4
相关论文
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  • [6] REACTIONS OF THIN-FILM TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY
    NEMANICH, RJ
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    [J]. APPLIED PHYSICS LETTERS, 1985, 46 (07) : 670 - 672
  • [7] INTERFERENCE ENHANCED RAMAN-SCATTERING STUDY OF THE INTERFACIAL REACTION OF PD ON A-SI-H
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    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 685 - 688
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