An 0.03-μm gate-length enhancement-mode InAlAs/InGaAs/InP MODFET's with 300 GHz fT and 2 S/mm extrinsic transconductance

被引:19
作者
Xu, D
Suemitsu, T
Osaka, J
Umeda, Y
Yamane, Y
Ishii, Y
Ishii, T
Tamamura, T
机构
[1] Nippon Telegraph & Tel Corp, Optoelect Labs, Atsugi, Kanagawa 2430198, Japan
[2] Nippon Telegraph & Tel Corp, Syst Elect Labs, Atsugi, Kanagawa 2430198, Japan
关键词
electrochemical processes; etching; high-speed circuits/devices; MODFET's; semiconductor device fabrication; semiconductor heterojunctions;
D O I
10.1109/55.761016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have developed high-performance enhancement-mode InP-based modulation-doped field-effect transistors with 0.03-mu m gate-length. A record high current gain cutoff frequency exceeding 300 GHz has been achieved, and the maximum extrinsic transconductance is as high as 2 S/mm with an associated drain current of 0.5 A/mm at a drain bias of 1 V, This high performance is a result of the reduction of gate length, the use of the high barrier metal Pt as gate electrodes, and most importantly, the employment of the well-developed wet etching technology that allows the formation of a very deep gate groove while retaining small side etching. The excellent E-MODFET performance opens up the possibility of implementing ever faster high-speed circuits based on direct-coupled FET logic.
引用
收藏
页码:206 / 208
页数:3
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