Intermixing in self-assembled InAs quantum dot formation

被引:34
作者
Heyn, C
Bolz, A
Maltezopoulos, T
Johnson, RL
Hansen, W
机构
[1] Univ Hamburg, Inst Angew Phys, D-20355 Hamburg, Germany
[2] Univ Hamburg, Zentrum Mikrostrukt Forsch, D-20355 Hamburg, Germany
[3] Univ Hamburg, Inst Expt Phys, D-22761 Hamburg, Germany
关键词
high-resolution X-ray diffraction; low-dimensional structuresr; reflection high-energy electron diffraction; segregation; semiconducting III-V materials;
D O I
10.1016/j.jcrysgro.2004.12.055
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The influence of growth parameters and substrate material on the basic processes during strain-induced InAs-quantum dot (QD) formation and the resulting structural properties of the QDs is studied with reflection high-energy electron diffraction (RHEED), atomic force microscopy (AFM), and X-ray diffraction. The process of strain-induced QD formation is strongly influenced by the intermixing with substrate material and the desorption of indium at high temperatures. From the experimental results, we conclude that the strain-energy modification due to temperature-dependent intermixing has a larger influence on QD formation than temperature-dependent kinetic processes at the surface. Interestingly, we also find that the maximum growth temperature limited by desorption depends on the growth speed. © 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:46 / 50
页数:5
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