Effect of thermal annealing of Ni/Au ohmic contact on the leakage current of GaN based light emitting diodes

被引:67
作者
Hsu, CY [1 ]
Lan, WH
Wu, YS
机构
[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[2] Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung 811, Taiwan
关键词
D O I
10.1063/1.1601306
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of thermal annealing on current-voltage properties of GaN light emitting diodes (LEDs) has been studied. At annealing temperatures above 700 degreesC, the p-n junction of the diodes became very leaky and Ga-contained metallic bubbles were observed on the surface of Ni/Au p-ohmic contact. Transmission electron microscopy and energy dispersive x-ray spectrometer studies revealed that these metallic bubbles resided directly on top of the threading dislocations in GaN and both Ni and Au were indiffused into the LED structure along the cores of the TDs. The conducting paths formed by the metal containing dislocation cores are believed to be the cause for the observed short circuit behavior of p-n junctions at high annealing temperatures. (C) 2003 American Institute of Physics.
引用
收藏
页码:2447 / 2449
页数:3
相关论文
共 17 条
[1]   Low-resistance ohmic contacts on p-type GaN using Ni/Pd/Au metallization [J].
Chu, CF ;
Yu, CC ;
Wang, YK ;
Tsai, JY ;
Lai, FI ;
Wang, SC .
APPLIED PHYSICS LETTERS, 2000, 77 (21) :3423-3425
[2]   Very low resistance multilayer ohmic contact to n-GaN [J].
Fan, ZF ;
Mohammad, SN ;
Kim, W ;
Aktas, O ;
Botchkarev, AE ;
Morkoc, H .
APPLIED PHYSICS LETTERS, 1996, 68 (12) :1672-1674
[3]   METAL CONTACTS TO GALLIUM NITRIDE [J].
FORESI, JS ;
MOUSTAKAS, TD .
APPLIED PHYSICS LETTERS, 1993, 62 (22) :2859-2861
[4]   Low-resistance ohmic contacts to p-type GaN [J].
Ho, JK ;
Jong, CS ;
Chiu, CC ;
Huang, CN ;
Chen, CY ;
Shih, KK .
APPLIED PHYSICS LETTERS, 1999, 74 (09) :1275-1277
[5]   Inhomogeneous spatial distribution of reverse bias leakage in GaN Schottky diodes [J].
Hsu, JWP ;
Manfra, MJ ;
Lang, DV ;
Richter, S ;
Chu, SNG ;
Sergent, AM ;
Kleiman, RN ;
Pfeiffer, LN ;
Molnar, RJ .
APPLIED PHYSICS LETTERS, 2001, 78 (12) :1685-1687
[6]   Ohmic contacts to p-type GaN using a Ni/Pt/Au metallization scheme [J].
Jang, JS ;
Park, KH ;
Jang, HK ;
Kim, HG ;
Park, SJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3105-3107
[7]   Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment [J].
Kim, JK ;
Lee, JL ;
Lee, JW ;
Shin, HE ;
Park, YJ ;
Kim, T .
APPLIED PHYSICS LETTERS, 1998, 73 (20) :2953-2955
[8]   Electrical characterization of GaN p-n junctions with and without threading dislocations [J].
Kozodoy, P ;
Ibbetson, JP ;
Marchand, H ;
Fini, PT ;
Keller, S ;
Speck, JS ;
DenBaars, SP ;
Mishra, UK .
APPLIED PHYSICS LETTERS, 1998, 73 (07) :975-977
[9]   LOW-RESISTANCE OHMIC CONTACTS ON WIDE BAND-GAP GAN [J].
LIN, ME ;
MA, Z ;
HUANG, FY ;
FAN, ZF ;
ALLEN, LH ;
MORKOC, H .
APPLIED PHYSICS LETTERS, 1994, 64 (08) :1003-1005
[10]   A review of the metal-GaN contact technology [J].
Liu, QZ ;
Lau, SS .
SOLID-STATE ELECTRONICS, 1998, 42 (05) :677-691