Nanometer-scale scanning sensors fabricated using stencil lithography

被引:44
作者
Champagne, AR [1 ]
Couture, AJ [1 ]
Kuemmeth, F [1 ]
Ralph, DC [1 ]
机构
[1] Cornell Univ, Atom & Solid State Phys Lab, Ithaca, NY 14853 USA
关键词
D O I
10.1063/1.1554483
中图分类号
O59 [应用物理学];
学科分类号
摘要
We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors. (C) 2003 American Institute of Physics.
引用
收藏
页码:1111 / 1113
页数:3
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