Chopping frequency dependence of photoacoustic spectrum in porous silicon

被引:3
作者
Kawahara, T
Mihara, M
Morimoto, J
Tahira, K
Motohashi, A
Kinoshita, A
Miyakawa, T
机构
[1] Natl Def Acad, Dept Mat Sci & Engn, Yokosuka, Kanagawa 2398686, Japan
[2] Natl Def Acad, Dept Elect Engn, Yokosuka, Kanagawa 2398686, Japan
[3] Chiba Inst Technol, Dept Comp Sci, Narashino, Chiba 2750016, Japan
[4] Tokyo Denki Univ, Fac Sci & Engn, Hatoyamacho Ishizaka, Hiki 3500394, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 2A期
关键词
PAS; photoacoustic spectroscopy; Si; porous Si; chopping frequency dependence; thermal diffusivity;
D O I
10.1143/JJAP.39.505
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dependence of photoacoustic (PA) spectra on the chopping frequency in the range of 10 to 180 Hz was studied in porous silicon (PS) samples of varying thicknesses the PS layer. The enhancement of PA signals over those of bulk Si, reported in our previous work, is ascribed to the combined effects of interstitial gas 'pressure and intrinsic change of absorption. Although the enhancement seen in the long wavelengths, above 600 nm in the thick PS samples, is mainly caused by the "pressure" effect, the enhancement in the short wavelengths, below 600 nm, appears to be mainly due to the intrinsic effects related to the quantum confinement effect because it increases as the porosity increases and seems to remain at higher chopping frequencies (f = 180 Hz). We could also estimate the thermal diffusivity of the PS samples from the crossover frequency of the change of slope in the log PA signal vs the log chopping frequency plot. The dependencies of the PA spectral edges on porosity and chopping frequency are shown and discussed in reference to the double layered structure model proposed in our previous work.
引用
收藏
页码:505 / 508
页数:4
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