Properties of isotype n-ZnO/n-GaN heterostructures studied by I-V-T and electron beam induced current methods

被引:16
作者
Alivov, Ya I. [1 ]
Xiao, B. [1 ]
Akarca-Biyikli, S. [1 ]
Fan, Q. [1 ]
Morkoc, H. [1 ]
Johnstone, D. [2 ]
Lopatiuk-Tirpak, O. [3 ]
Chernyak, L. [3 ]
Litton, W. [4 ]
机构
[1] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[2] SEMETROL, Chesterfield, VA 23838 USA
[3] Univ Cent Florida, Dept Phys, Orlando, FL 32816 USA
[4] AFRL, MLPS, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1088/0953-8984/20/8/085201
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Electrical properties of isotype n-ZnO/n-GaN heterostructures obtained by radio-frequency sputtering of ZnO films on GaN layers are studied by means of temperature dependent current-voltage (I-V-T) characterization and electron beam induced current (EBIC) measurements. The n-ZnO/n-GaN diodes showed highly rectifying behavior with a forward and reverse current ratio of about 10(6) at +/- 5 V. From the analysis of I-V-T measurements, a conduction band offset of similar to 0.62 eV was derived. From EBIC measurements, the minority carrier diffusion length of ZnO was estimated to lie in the range 0.125-0.175 mu m, while an activation energy was derived as 0.462 +/- 0.073 V and was attributed to the traps.
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页数:4
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