AlAs oxidation system with H2O vaporizer for oxide-confined surface emitting lasers

被引：13

作者：

Arai, M ^{[1
]}

Nishiyama, N ^{[1
]}

Shinada, S ^{[1
]}

Koyama, F ^{[1
]}

Iga, K ^{[1
]}

机构：

[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 6A期

关键词：

oxidation; AlAs; surface emitting laser;

D O I：

10.1143/JJAP.39.3468

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have developed an oxidation apparatus with high reproducibility for fabricating oxide-confined vertical cavity surface emitting lasers (VCSELs). Precise control of AlAs oxidation can be realized for a high-performance VCSEL array in mass production. In this system, we introduce a vaporizer with a water mass flow controller for stable and precise control of H2O vapor. We have achieved good reproducibility and controllability. The run-to-run deviation of the oxidized window is +/- 0.1 mu m for nominal similar to 10.4 mu m oxidation.

引用

页码：3468 / 3469

页数：2

共 6 条

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