Effect of nitrogen partial pressure on the surface morphology and properties of reactive dc magnetron sputtered (Ti,Al)N coatings

被引：15

作者：

Wuhrer, R ^{[1
]}

Kim, S ^{[1
]}

Yeung, WY ^{[1
]}

机构：

[1] UNIV TECHNOL SYDNEY,DEPT MAT SCI,BROADWAY,NSW 2007,AUSTRALIA

来源：

SCRIPTA MATERIALIA | 1997年 / 37卷 / 08期

关键词：

D O I：

10.1016/S1359-6462(97)00239-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

[No abstract available]

引用

页码：1163 / 1169

页数：7

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