Effects of thermal treatment of low-temperature GaN buffer layers on the quality of subsequent GaN layers

The surface morphology and crystalline quality of GaN layers grown by metalorganic chemical vapor deposition on sapphire (0001) substrates were investigated for various thermal treatment conditions of low-temperature (LT)-grown GaN buffer layers. The surface morphology and crystalline quality of subsequently grown high-temperature (HT) GaN layers strongly depended on thermal effects during the temperature ramping process after LT growth of the buffer layers, We have found that the defect density and structure are affected by this temperature ramping process, and that the generation of growth pits is closely related to defects in the HT-GaN layers, High-quality HT-GaN layers with specular surface morphology were obtained with optimum growth and ramping conditions for the LT-GaN buffer layers. Furthermore, the role of thermal treatment during the temperature ramping process was identified, and mechanisms of nucleus formation, HT-growth initiation on the LT-GaN buffer layers, and defect formation are proposed and discussed. (C) 1997 American Institute of Physics.