Photoluminescence and recombination mechanisms in GaN/Al0.2Ga0.8N superlattice

A detailed study of photoluminescence (PL) of GaN(1 nm)/Al0.2Ga0.8N(3.3 nm) twenty periods superlattice grown via metal-organic chemical vapor deposition is presented. The dependence of the PL emission energy, linewidth, and intensity on temperature, in the low temperature regime, is consistent with recombination mechanisms involving bandtail states attributed to a small degree of interfacial disorder. The activation energy of the nonradiative centers in our superlattice agrees well with the value we derive for the width of the tail-state distribution. Moreover, we find that the average phonon energy of the phonons that control the interband PL energy at high temperatures is larger for the superlattice than for a high-quality GaN film. This observation is consistent with model calculations predicting the phonon mode properties of GaN-AlN-based wurtzite heterostructures. (C) 2000 American Institute of Physics. [S0003-6951(00)00915-3].