Shrinking solid-state nanopores using electron-beam-induced deposition

被引:41
作者
Kox, Ronald [1 ,2 ]
Chen, Chang [1 ,3 ]
Maes, Guido [3 ]
Lagae, Liesbet [1 ,4 ]
Borghs, Gustaaf [1 ,4 ]
机构
[1] IMEC VZW, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, Dept Elect Engn, B-3001 Louvain, Belgium
[3] Katholieke Univ Leuven, Dept Chem, B-3001 Louvain, Belgium
[4] Katholieke Univ Leuven, Dept Phys, B-3001 Louvain, Belgium
关键词
FABRICATION; DNA;
D O I
10.1088/0957-4484/20/11/115302
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Solid-state nanopores of only a few nanometres in size show a great potential for applications such as molecule detection and DNA sequencing. In most cases, the fabrication of such a nanopore requires the high energy beam of a transmission electron microscope (TEM) or focused ion beam (FIB) tool to drill or reshape a small hole in a freestanding membrane. Here, we present a novel method to reduce the size of existing nanopores using electron-beam-induced deposition (EBID) of carbon in a conventional scanning electron microscope (SEM). The existing nanopores are etched in a silicon membrane using anisotropic wet etching and can be shrunk down to a few nanometres using EBID. This paper discusses the parameters that influence the rate of shrinking and provides an insight into the underlying mechanism.
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页数:6
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