Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications

被引：12

作者：

Cheng, Joy Y. ^{[1
]}

Nelson, Alshakim ^{[1
]}

Rettner, Charles T. ^{[1
]}

Sanders, Daniel P. ^{[1
]}

Sutherland, Alexander ^{[1
]}

Pitera, Jed W. ^{[1
]}

Na, Young-Hye ^{[1
]}

Kim, Ho-Cheol ^{[1
]}

Hinsberg, William D. ^{[1
]}

机构：

[1] IBM Almaden Res Ctr, San Jose, CA 95120 USA

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2009年 / 22卷 / 02期

关键词：

directed self-assembly; block copolymers; resolution enhancement; self-healing; scalability; BLOCK-COPOLYMERS;

D O I：

10.2494/photopolymer.22.219

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：219 / 222

页数：4

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