AlGaN/GaN HEMTs on Si substrate with 7 W/mm output power density at 10 GHz

被引:67
作者
Dumka, DC
Lee, C
Tserng, HQ
Saunier, P
Kumar, M
机构
[1] TriQuint Semicond Texas, R&D Engn, Richardson, TX 75083 USA
[2] Lockheed Martin NE&SS, Moorestown, NJ 08057 USA
关键词
D O I
10.1049/el:20045292
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The first 10 GHz power performance of AlGaN/GaN HEMTs on silicon substrate is reported. Molecular beam epitaxy grown AlGaN/GaN heterostructure and field-plate gates with 0.3 mum length are employed to fabricate the devices on 2-inch Si (111) substrates. A maximum current density of 850 mA/mm and an extrinsic transconductance of 220 mS/mm, are achieved. Load pull measurements at 10 GHz demonstrate a continuous-wave output power density of 7 W/mm, which is the highest power density reported to date for an Si-based transistor. A peak power added efficiency of 52% is achieved for these devices at 10 GHz.
引用
收藏
页码:1023 / 1024
页数:2
相关论文
共 7 条
[1]   10-W/mm AlGaN-GaNHFET with a field modulating plate [J].
Ando, Y ;
Okamoto, Y ;
Miyamoto, H ;
Nakayama, T ;
Inoue, T ;
Kuzuhara, M .
IEEE ELECTRON DEVICE LETTERS, 2003, 24 (05) :289-291
[2]   AlGaN/GaN HEMTs on Si(111) with 6.6 W/mm output power density [J].
Behtash, R ;
Tobler, H ;
Neuburger, M ;
Schurr, A ;
Leier, H ;
Cordier, Y ;
Semond, F ;
Natali, F ;
Massies, J .
ELECTRONICS LETTERS, 2003, 39 (07) :626-628
[3]   AlGaN/GaN HEMTs on resistive Si (111) substrate grown by gas-source MBE [J].
Cordier, Y ;
Semond, F ;
Massies, J ;
Dessertene, B ;
Cassette, S ;
Surrugue, M ;
Adam, D ;
Delage, SL .
ELECTRONICS LETTERS, 2002, 38 (02) :91-92
[4]   AlGaN/GaN HEMTs on (111) silicon substrates [J].
Javorka, P ;
Alam, A ;
Wolter, M ;
Fox, A ;
Marso, M ;
Heuken, M ;
Lüth, H ;
Kordos, P .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (01) :4-6
[5]   A NOVEL HIGH-VOLTAGE HIGH-SPEED MESFET USING A STANDARD GAAS DIGITAL IC PROCESS [J].
MOK, PKT ;
SALAMA, CAT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (02) :246-250
[6]   High electron mobility AlGaN/GaN heterostructure on (111) Si [J].
Schremer, AT ;
Smart, JA ;
Wang, Y ;
Ambacher, O ;
MacDonald, NC ;
Shealy, JR .
APPLIED PHYSICS LETTERS, 2000, 76 (06) :736-738
[7]   Very-high power density AlGaN/GaN HEMTs [J].
Wu, YF ;
Kapolnek, D ;
Ibbetson, JP ;
Parikh, P ;
Keller, BP ;
Mishra, UK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (03) :586-590