Scaling behavior of ZnO transparent thin-film transistors

被引:125
作者
Hsieh, Hsing-Hung
Wu, Chung-Chih [1 ]
机构
[1] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10917, Taiwan
[2] Natl Taiwan Univ, Grad Inst Electroopt Engn, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
关键词
Thin film transistors;
D O I
10.1063/1.2235895
中图分类号
O59 [应用物理学];
学科分类号
摘要
Scaling behaviors of ZnO transparent thin-film transistors (TTFTs) have been studied by fabricating series of miniaturized ZnO TTFTs having various channel widths and lengths. Mobility of > 8 cm(2)/V s and on/off ratio of up to 10(7) are achieved with these TTFTs. Results show that these ZnO TTFTs retain rather well-behaved transistor characteristics down to the channel length of similar to 5 mu m, rendering possible high-resolution applications. More apparent short-channel effects (e.g., lowering of threshold voltages, degradation of the subthreshold slope with the decrease of the channel length and the increase of the drain voltage, loss of hard saturation, etc.) are observed when the channel length is reduced below 5 mu m.
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页数:3
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