Compositional variation in Si-rich SiGe single crystals grown by multi-component zone melting method using Si seed and source crystals

被引:32
作者
Nakajima, K
Kusunoki, T
Azuma, Y
Usami, N
Fujiwara, K
Ujihara, T
Sazaki, G
Shishido, T
机构
[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
heterostructure; Bridgman method; growth from melt; single crystal growth; germanium silicon alloys;
D O I
10.1016/S0022-0248(02)00940-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of the supply of depleted Si solute elements on the compositional variation in the Si-rich SiGe bulk crystals was studied using the method which was used to grow Ge-rich SiGe single crystals with a uniform composition. By selecting the proper pulling rate, we can obtain Si-rich Si1-xGex bulk crystals with uniform composition of x = 0.1 without using the supply mechanism of depleted Si solute elements. When the supply mechanism of Si solute elements was used. the initial composition in Si-rich SiGe crystals can be much more easily determined by controlling the growth temperature than that in Ge-rich crystals because the Si seed crystal is not melted down. The supply of Si solute elements is very effective to change the compositional variation even for Si-rich SiGe crystals. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:373 / 381
页数:9
相关论文
共 23 条
[1]   Single crystal growth of Si1-xGex by the Czochralski technique [J].
Abrosimov, NV ;
Rossolenko, SN ;
Alex, V ;
Gerhardt, A ;
Schroder, W .
JOURNAL OF CRYSTAL GROWTH, 1996, 166 (1-4) :657-662
[2]   Distribution of components in Ge-Si bulk single crystals grown under the continuous feeding of the melt with the second component (Si) [J].
Azhdarov, GK ;
Küçükömeroglu, T ;
Varilci, A ;
Altunbas, M ;
Kobya, A ;
Azhdarov, PG .
JOURNAL OF CRYSTAL GROWTH, 2001, 226 (04) :437-442
[3]   Growth of SiGe bulk crystal with uniform composition by directly controlling the growth temperature at the crystal-melt inter-face using in situ monitoring system [J].
Azuma, Y ;
Usami, N ;
Ujihara, T ;
Sazaki, G ;
Murakami, Y ;
Miyashita, S ;
Fujiwara, K ;
Nakajima, K .
JOURNAL OF CRYSTAL GROWTH, 2001, 224 (3-4) :204-211
[4]   Float zone growth and characterization of Ge1-xSix (x≤10 at%) single crystals [J].
Campbell, TA ;
Schweizer, M ;
Dold, P ;
Cröll, A ;
Benz, KW .
JOURNAL OF CRYSTAL GROWTH, 2001, 226 (2-3) :231-239
[5]   Bulk single crystal growth of silicon-germanium [J].
Deitch, RH ;
Jones, SH ;
Digges, TG .
JOURNAL OF ELECTRONIC MATERIALS, 2000, 29 (09) :1074-1078
[6]   MACROSEGREGATION DURING BRIDGMAN GROWTH OF GE1-XSIX MIXED-CRYSTALS [J].
HELMERS, L ;
SCHILZ, J ;
BAHR, G ;
KAYSSER, WA .
JOURNAL OF CRYSTAL GROWTH, 1995, 154 (1-2) :60-67
[7]   A boundary layer model for macrosegregation of Bridgman grown Ge1-xSix mixed crystals [J].
Helmers, L ;
Schilz, J ;
Bahr, G .
JOURNAL OF CRYSTAL GROWTH, 1996, 165 (04) :381-386
[8]   TEMPERATURE-DEPENDENCE OF RESISTIVITY AND HALL-MOBILITY IN FLOATING ZONE GROWN BULK SILICON-GERMANIUM ALLOYS [J].
KISHORE, R ;
PRAKASH, P ;
SINGH, SN ;
DAS, BK .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (09) :4341-4343
[9]   CZOCHRALSKI GROWTH OF SIXGE1-X SINGLE-CRYSTALS [J].
KURTEN, M ;
SCHILZ, J .
JOURNAL OF CRYSTAL GROWTH, 1994, 139 (1-2) :1-5
[10]   GROWTH OF TERNARY IN0.14GA0.86AS BULK CRYSTAL WITH UNIFORM COMPOSITION AT CONSTANT TEMPERATURE THROUGH GAAS SUPPLY [J].
KUSUNOKI, T ;
TAKENAKA, C ;
NAKAJIMA, K .
JOURNAL OF CRYSTAL GROWTH, 1991, 115 (1-4) :723-727