Investigations on V-defects in quaternary AlInGaN epilayers

被引:51
作者
Liu, JP
Wang, YT
Yang, H
Jiang, DS
Jahn, U
Ploog, KH
机构
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
[3] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
关键词
D O I
10.1063/1.1767959
中图分类号
O59 [应用物理学];
学科分类号
摘要
The characteristics of V-defects in quaternary AlInGaN epilayers and their correlation with fluctuations of the In distribution are investigated. The geometric size of the V-defects is found to depend on the In composition of the alloy. The V-defects are nucleated within the AlInGaN layer and associated with threading dislocations. Line scan cathodoluminescence (CL) shows a redshift of the emission peak and an increase of the half width of the CL spectra as the electron beam approaches the apex of the V-defect. The total redshift decreases with decreasing In mole fraction in the alloy samples. Although the strain reduction may partially contribute to the CL redshift, indium segregation is suggested to be responsible for the V-defect formation and has a main influence on the respective optical properties. (C) 2004 American Institute Of Physics.
引用
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页码:5449 / 5451
页数:3
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