Roles of hydrogen and nitrogen in p-type doping of ZnO

被引:29
作者
Lu, J. G. [1 ]
Fujita, S.
Kawaharamura, T.
Nishinaka, H.
机构
[1] Kyoto Univ, Int Innovat Ctr, Nishikyo Ku, Kyoto 6158520, Japan
[2] Kyoto Univ, Dept Elect Sci & Engn, Nishikyo Ku, Kyoto 6158510, Japan
基金
日本学术振兴会;
关键词
D O I
10.1016/j.cplett.2007.04.085
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
N-doped ZnO thin films were prepared by atmospheric pressure mist chemical vapor deposition. The behaviors of H and N impurities were systematically studied, and a hydrogen-assisted nitrogen-doping mechanism was proposed to produce p-type ZnO. The H and N concentrations showed a linear correlation in as-grown samples. The p-type conductivity was realized by rapid thermal annealing in N-2 environment, with the hole concentrations typically of 10(17) cm(-3) at 475-500 degrees C. In this temperature window the dissociated hydrogen showed significant outdiffusion, while the nitrogen still remained stable in ZnO and behaved as effective acceptors resulting in good p-type conductivity. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:68 / 71
页数:4
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