Effect of electrostatic screening on apparent shifts in photoemission spectra near metal/organic interfaces

被引：34

作者：

Helander, M. G. ^{[1
]}

Greiner, M. T. ^{[1
]}

Wang, Z. B. ^{[1
]}

Lu, Z. H. ^{[1
,2
]}

机构：

[1] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada

[2] Yunnan Univ, Dept Phys, Kunming 650091, Yunnan, Peoples R China

来源：

PHYSICAL REVIEW B | 2010年 / 81卷 / 15期

基金：

加拿大自然科学与工程研究理事会;

关键词：

COPPER PHTHALOCYANINE; ELECTRONIC-STRUCTURES; LEVEL ALIGNMENT; THIN-FILMS; ENERGY; SPECTROSCOPY; SURFACE; METAL;

D O I：

10.1103/PhysRevB.81.153308

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Photoemission spectra of very thin organic films differ from that of thicker bulklike films. In particular, the binding-energy shifts in molecular orbitals at metal/organic interfaces vary as a function of the organic over-layer thickness. Using a simple image-charge model it is found that electrostatic screening can have a significant effect on the final-state relaxation energy. Good agreement between experimental results and theoretical calculations for a variety of dielectric substrates indicate that reported thickness dependent energy-level shifts in organic overlayer spectra can be accounted for by electrostatic screening. Models of organic interfaces based on photoemission spectra of organic thin films should therefore be re-examined.

引用

页数：4

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