Occurrence of Rotation Domains in Heteroepitaxy

被引:78
作者
Grundmann, Marius [1 ]
Boentgen, Tammo [1 ]
Lorenz, Michael [1 ]
机构
[1] Univ Leipzig, Inst Expt Phys 2, D-04103 Leipzig, Germany
关键词
CHEMICAL-VAPOR-DEPOSITION; WALLED CARBON NANOTUBES; INFRARED DIELECTRIC FUNCTIONS; MOLECULAR-BEAM EPITAXY; THIN-FILM GROWTH; R-PLANE SAPPHIRE; ZNO FILMS; ORIENTED GROWTH; SILICON; SUBSTRATE;
D O I
10.1103/PhysRevLett.105.146102
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Heteroepitaxy can involve materials with a misfit of crystal structure. Rotation domains in the epilayer are a fundamental consequence. We derive a general expression for their (minimum) number which is determined by the mismatch of the rotational symmetries of the substrate and epilayer. In the case of a mismatch of rotational symmetry, the number of rotation domains of material A on material B is different from that of B on A. A larger number of rotation domains can occur due to domain structure or nearly fulfilled additional symmetries of the substrate surface.
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页数:4
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