Growth of high quality, epitaxial InSb nanowires

被引:50
作者
Park, Hyun D. [1 ]
Prokes, S. M.
Twigg, M. E.
Ding, Yong
Wang, Zhong Lin
机构
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA
关键词
epitaxial; nanowires; narrow bandgap; InSb;
D O I
10.1016/j.jcrysgro.2007.03.023
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The growth of InSb nanowires on an Insb(111) substrate in a closed system is described. A high density InSb nanowires was grown by the use of InSb substrates in a torch sealed quartz tube at a temperature of 400 degrees C, using a 60 nm size gold colloid catalyst. The typical diameter of the InSb nanowires was 80-200 nm and they consisted of nearly equal atomic percent of In and Sb. Transmission electron microscopy showed the wires to be single crystal, with a growth direction of < 110 >. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:399 / 401
页数:3
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