Conduction behavior change in amorphous LaLuO3 dielectrics based on correlated barrier hopping theory

被引:23
作者
Li, Kui [1 ,2 ]
Xia, Yidong [1 ,2 ]
Xu, Bo [1 ,2 ]
Gao, Xu [2 ,3 ]
Guo, Hongxuan [4 ]
Liu, Zhiguo [1 ,2 ]
Yin, Jiang [2 ,3 ]
机构
[1] Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
[3] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
[4] Natl Inst Mat Sci, Adv Nano Characterizat Ctr, Tsukuba, Ibaraki 3050047, Japan
基金
中国国家自然科学基金;
关键词
amorphous state; dielectric thin films; electrical conductivity transitions; electrical resistivity; hopping conduction; lanthanum compounds; switching; vacancies (crystal); MEMORY APPLICATIONS; OXIDE-FILMS; RESISTANCE; MODEL;
D O I
10.1063/1.3425671
中图分类号
O59 [应用物理学];
学科分类号
摘要
Unipolar switching behaviors have been revealed in amorphous LaLuO3, which makes it suited for not only logic but memory applications using the conventional semiconductor or the emerging nano/CMOS architectures. Such switching is comprehended with regard to the conduction behavior transition between high- and low-resistance states. The conduction in high- resistance state follows the Poole's law, whereas the conduction in low-resistance state is dominated by percolation. The transition between these resistance states is attributed to the change in the separation between oxygen vacancy sites in the light of the correlated barrier hopping theory. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3425671]
引用
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页数:3
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