Ablation of organic polymers by 46.9-nm-laser radiation -: art. no. 034109

被引：71

作者：

Juha, L

Bittner, M

Chvostova, D

Krasa, J

Otcenasek, Z

Präg, AR

Ullschmied, J

Pientka, Z

Krzywinski, J

Pelka, JB

Wawro, A

Grisham, ME

Vaschenko, G

Menoni, CS

Rocca, JJ

机构：

[1] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic

[2] Acad Sci Czech Republ, Inst Macromol Chem, Prague 16206 6, Czech Republic

[3] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland

[4] NSF ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[5] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 03期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.1854741

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report results of the exposure of poly (tetrafluoroethylene) -(PTFE), poly(methyl methacrylate) -(PMMA), and polyimide -(PI) to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from similar to0.1 to - 10 J/cm(2). The ablation rates were found to be similar for all three materials, similar to80-90 nm/pulse at 1 J/cm(2). The results suggest that the ablation of organic polymers induced by intense extreme ultraviolet laser radiation differs from that corresponding to irradiation with longer wavelengths. (C) 2005 American Institute of Physics.

引用

页码：1 / 3

页数：3

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[11] X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].