Electroluminescence of silicon nanocrystallites prepared by pulsed laser ablation in reduced pressure inert gas

被引:72
作者
Yoshida, T
Yamada, Y
Orii, T
机构
[1] Matsushita Res Inst Tokyo Inc, Tama Ku, Kawasaki, Kanagawa 214, Japan
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 305, Japan
关键词
D O I
10.1063/1.367373
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on an electroluminescent (EL) diode with novel active layers of silicon (Si) nanocrystallites. The Si nanocrystallite active layer was prepared by pulsed laser ablation in an ambient of reduced pressure inert gas. The structure of the EL diodes was semitransparent platinum (Pt) electrode/Si nanocrystallite layer/p-type Si/Pt electrode. We have observed visible spectra of not only photoluminescence around 2.07 eV, but also EL around 1.66 eV at room temperature. The EL diodes showed a rectifying behavior caused by a Schottky-like junction. Furthermore, we have found that the EL diodes showed strong nonlinear dependence of EL intensity on current density. A possible mechanism of the EL diode emission is impact ionization by minority hot carriers injected through the surface oxide layers and the successive radiative recombination. (C) 1998 American Institute of Physics.
引用
收藏
页码:5427 / 5432
页数:6
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