Effect of spacer layer thickness on energy level width narrowing in GaInAs/InP resonant tunneling diodes grown by organo-metallic vapor phase epitaxy

被引:12
作者
Oobo, T
Takemura, R
Sato, K
Suhara, M
Miyamoto, Y
Furuya, K
机构
[1] Tokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, Tokyo 152, Japan
[2] Tokyo Inst Technol, Res Ctr Quantum Effect Elect, Meguro Ku, Tokyo 152, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 02期
关键词
resonant tunneling diodes; spacer layer thickness; resonant level width; impurity ion; OMVPE; GaInAs/InP;
D O I
10.1143/JJAP.37.445
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied the effect of spacer layer thickness on the resonant level width in resonant tunneling diodes (RTDs). GaInAs/InP RTDs were fabricated with various spacer layer thicknesses using organo-metallic vapor phase epitaxy; and the resonant level width was estimated. As a result, the resonant level width was found to decrease with increasing spacer layer thickness. To discuss this tendency, a theoretical model of the interface fluctuation between spacer layers and electrodes, caused by the random distribution of the impurity ions in electrodes, was proposed.
引用
收藏
页码:445 / 449
页数:5
相关论文
共 14 条
[1]   APPROXIMATION OF FERMI-DIRAC INTEGRAL F1/2(ETA) [J].
BEDNARCZYK, D ;
BEDNARCZYK, J .
PHYSICS LETTERS A, 1978, 64 (04) :409-410
[2]   EFFECT OF SI DOPING IN ALAS BARRIER LAYERS OF ALAS-GAAS-ALAS DOUBLE-BARRIER RESONANT TUNNELING DIODES [J].
CHENG, P ;
HARRIS, JS .
APPLIED PHYSICS LETTERS, 1989, 55 (06) :572-574
[3]   NOVEL HIGH-SPEED TRANSISTOR USING ELECTRON-WAVE DIFFRACTION [J].
FURUYA, K .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) :1492-1494
[4]  
GAULT M, 1993, INT C SSDM JAP SEPT
[5]  
HUNG CI, 1988, APPL PHYS LETT, V51, P121
[6]   EFFECTS OF SUBSTRATE TEMPERATURES ON THE DOPING PROFILES OF SI IN SELECTIVELY DOPED ALGAAS/GAAS/ALGAAS DOUBLE-HETEROJUNCTION STRUCTURES [J].
INOUE, K ;
SAKAKI, H ;
YOSHINO, J ;
YOSHIOKA, Y .
APPLIED PHYSICS LETTERS, 1985, 46 (10) :973-975
[7]   EVALUATION OF HOT-ELECTRON COHERENT LENGTH USING WELL WIDTH DEPENDENCE OF THE RESONANCE CHARACTERISTICS OF RESONANT-TUNNELING DIODES [J].
KANG, YC ;
SUHARA, M ;
FURUYA, K ;
KOIZUMI, R .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (8B) :4417-4419
[8]   ESTIMATION OF PHASE COHERENT LENGTH OF HOT-ELECTRONS IN GAINAS USING RESONANT-TUNNELING DIODES [J].
KANG, YC ;
FURUYA, K ;
SUHARA, M ;
MIYAMOTO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12A) :6491-6495
[9]   WAVE-FRONT SPREAD OF HOT-ELECTRONS GENERATED BY PLANER TUNNEL EMITTERS [J].
MATSUURA, H ;
FURUYA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (7A) :3589-3592
[10]   SHARP RESONANCE CHARACTERISTICS IN TRIPLE-BARRIER DIODES WITH A THIN UNDOPED SPACER LAYER [J].
NAKAGAWA, T ;
FUJITA, T ;
MATSUMOTO, Y ;
KOJIMA, T ;
OHTA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (06) :L980-L982