Interaction of A-centers with isovalent impurities in silicon

被引:62
作者
Chroneos, A. [1 ]
Londos, C. A. [2 ]
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2BP, England
[2] Univ Athens, Solid State Phys Sect, Athens 15784, Greece
关键词
ELECTRON IRRADIATED SILICON; N-TYPE SILICON; OXYGEN COMPLEXES; ROOM-TEMPERATURE; GERMANIUM; DIFFUSION; DEFECTS; CARBON; TIN; RESONANCE;
D O I
10.1063/1.3409888
中图分类号
O59 [应用物理学];
学科分类号
摘要
An A-center is an oxygen interstitial atom near a lattice vacancy and is one of the most common impurity-defect pairs in Czochralski-grown silicon crystals. In the present study, density functional theory calculations have been used to predict the binding energies of A-centers that are at nearest neighbor (NN) and next NN sites to isovalent impurities (carbon, germanium, and tin) in silicon. Interestingly, we predict that the A-center is more bound in isovalent-doped and, in particular, tin-doped silicon. We calculate that most of the binding energy of these A-centers originates from the interaction between the isovalent atoms and the vacancies. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3409888]
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页数:4
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