High-speed resonant cavity enhanced Ge photodetectors on reflecting Si substrates for 1550-nm operation

被引:123
作者
Dosunmu, OI [1 ]
Cannon, DD
Emsley, MK
Kimerling, LC
Ünlü, MS
机构
[1] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[3] Analog Dev, Wilmington, MA 01887 USA
关键词
Germanium (Ge); photodetectors; resonant cavity enhanced (RCE); silicon-on-insulator (SOI);
D O I
10.1109/LPT.2004.836917
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have designed and fabricated high-speed resonant cavity enhanced germanium (Ge) Schottky photodetectors on a silicon-on-insulator substrate. These back-illuminated detectors have demonstrated 3-dB bandwidths of more than 12 GHz at 3-V reverse bias and a peak quantum efficiency of 59% (R = 0.73 A/W) at the resonant wavelength of similar to1540 nm. Time domain measurements of our Ge photodetectors with diameters of up to 48 mum show transit-time limited impulse responses corresponding to bandwidths of at least 6.7 GHz, making these detectors compatible with 10-Gb/s data communication systems.
引用
收藏
页码:175 / 177
页数:3
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