DX CENTERS IN III-V-COMPOUND AND ALLOY SEMICONDUCTORS AS STUDIED BY HYDROSTATIC-PRESSURE EXPERIMENTS

被引:26
作者
FUJISAWA, T
YOSHINO, J
KUKIMOTO, H
机构
[1] Tokyo Inst of Technology, Japan
关键词
17;
D O I
10.1016/0022-0248(89)90204-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:243 / 248
页数:6
相关论文
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