共 22 条
- [1] CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P203
- [4] SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 281 - 287
- [5] DAUTREMONTSMITH WC, UNPUB J VAC SCI TECH
- [7] RUTHERFORD BACKSCATTERING AND CHANNELING ANALYSIS OF INTERFACES AND EPITAXIAL STRUCTURES [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 : 149 - 176
- [8] EFFECT OF SECONDARY ELECTRONS AND NEGATIVE-IONS ON SPUTTERING OF FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 406 - 409
- [9] MEAN FREE PATH OF NEGATIVE-IONS IN DIODE SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04): : 1597 - 1600
- [10] HARPER JME, 1981, J VAC SCI TECHNOL, V18, P112, DOI 10.1116/1.570687